EECE5161 — Thin Film Technologies: Reviews & Ratings

EECE5161 (Thin Film Technologies) course reviews and ratings at Northeastern (NEU). Average rating 3.5/5. Compare professors with RateMyProfessor reviews.

Covers the fundamentals of vacuum technology, thin film deposition technologies, characterization technologies, their applications in different industries, and the frontiers of research activities on thin film deposition technologies. Thin films are fundamental building blocks for integrated circuits chips, microelectromechanical systems (MEMS) devices, and nanoelectromechanical system devices (NEMS), etc., and play critical roles in determining the performance of IC circuits, MEMS, and NEMS devices. Topics include vacuum technologies; vacuum pumps; vacuum system design and analysis; different thin film deposition technologies, including sputtering, chemical vapor deposition, electrochemical deposition, atomic layer deposition, etc.; and different thin film characterization technologies, in particular the magnetic thin film characterization technologies, including VSM, PPMS, FMR, MOKE, etc. Students who do not meet course prerequisites may seek permission of instructor.

Average rating
3.5/5
Difficulty
4.5/5
Ratings
2
Last taught
Fall 2026
Credits
4 Hours
Prerequisites
((MATH 1342 with a minimum grade of D- or MATH 211M with a minimum grade of D- ); PHYS 1155 with a minimum grade of D- ) or graduate program admission

Professors

Data updated October 2026.

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